Special Section on Photomask Manufacturing Technology

Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks

[+] Author Affiliations
Takeshi Isogawa, Kazunori Seki, Shinji Akima

Toppan Photomasks Inc., 1000 River Street, Essex Junction, Vermont 05452, United States

Mark Lawliss, Jed Rankin

GLOBALFOUNDRIES, 1000 River Street, Essex Junction, Vermont 05452, United States

Zhengqing John Qi

GLOBALFOUNDRIES, 275 Fuller Road, Albany, New York 12203, United States

J. Micro/Nanolith. MEMS MOEMS. 15(2), 021010 (Mar 18, 2016). doi:10.1117/1.JMM.15.2.021010
History: Received October 29, 2015; Accepted February 29, 2016
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Abstract.  A variety of repairs were conducted on extreme ultraviolet (EUV) multilayer, including protection against pattern degradation in manufactural use, in order to evaluate feasibility of multilayer repair and subsequent protection schemes. The efficacy of postrepair protection techniques is evaluated to determine the lifetime of multilayer repairs. Simulations were used to select the optimal material thicknesses for repair protection, and the simulation results are verified with the lithographic results. The results showed a high correlation coefficient. Finally, all repaired sites were cleaned multiple times to quantify repair durability and impact on wafer critical dimension (CD). Aerial imaging of the repair sites before and after cleans showed a dramatic degradation of wafer CD. However, we show that applying a surface protection material after multilayer repair successfully mitigates the influence of multilayer degradation during extensive manufacturing operations.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Takeshi Isogawa ; Kazunori Seki ; Mark Lawliss ; Zhengqing John Qi ; Jed Rankin, et al.
"Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks", J. Micro/Nanolith. MEMS MOEMS. 15(2), 021010 (Mar 18, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.021010


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