Special Section on Photomask Manufacturing Technology

Special Section Guest Editorial: Photomask Manufacturing Technology

[+] Author Affiliations
Masato Shibuya

Tokyo Polytechnic University, Media and Image Technology Department, 1583 Iiyama, Atsugi-Shi, Kanagawa, Japan

Morihisa Hoga

Dai Nippon Printing Co., Ltd., Research and Development Center, 250-1 Wakashiba, Kashiwa, Chiba, Japan

Kiwamu Takehisa

Lasertec Corporation, 2-10-1 Shin-yokohama, Kohoku-ku, Yokohama, Kanagawa, 222-8552 Japan

J. Micro/Nanolith. MEMS MOEMS. 15(2), 021001 (Mar 31, 2016). doi:10.1117/1.JMM.15.2.021001
Text Size: A A A

Open Access Open Access

Photomask manufacturing technologies have been improving to support the steadily growing semiconductor industry. Those improvements cannot ever be achieved without the efforts of many researchers and engineers in the photomask community. It is our desire that the improvements realized by their innovative ideas would be widely appreciated by the readers of this journal.

Therefore we appreciate all of the expert authors who have provided contributions to this special section. The contributions are related to one of the following areas of today’s most important photomask manufacturing subjects:

  • EUV mask, which is considered to be used to realize <10 nm patterning, though there are still many difficult challenges such as defect management, pattern inspection, and pellicle realization.
  • Nanoimprint, which is an alternative lithography, substituting for EUVL, featuring low cost patterning, though it has a challenge of defect management.
  • OPC (optical proximity correction), which is indispensable in making all of today’s advanced photomasks and is becoming more and more aggressive.
  • Mask writing technology, the tighter specs of which are becoming quite difficult to meet due to increasing pattern density and data volume.

We hope you will be encouraged by these excellent works as the important milestones of the photomask manufacturing infrastructure. Of course, readers should draw their own conclusions, and, toward that, we urge readers to continue adding to the discussion by publishing new works that can further improve photomask manufacturing technology.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Masato Shibuya ; Morihisa Hoga and Kiwamu Takehisa
"Special Section Guest Editorial: Photomask Manufacturing Technology", J. Micro/Nanolith. MEMS MOEMS. 15(2), 021001 (Mar 31, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.2.021001


Figures

Tables

References

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.