Special Section on Alternative Lithographic Technologies V

Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size

[+] Author Affiliations
Li Ding, Jin Qin, Liang Wang

University of Science and Technology of China, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Optics and Optical Engineering, No. 96, JinZhai Road, Baohe District, Hefei, Anhui 230026, China

Yang Chen

University of Science and Technology of China, Micro and Nano Engineering Lab, Department of Precision Machinery and Precision Instrumentation, No. 96, JinZhai Road, Baohe District, Hefei, Anhui 230026, China

J. Micro/Nanolith. MEMS MOEMS. 15(3), 031611 (Sep 29, 2016). doi:10.1117/1.JMM.15.3.031611
History: Received April 28, 2016; Accepted September 15, 2016
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Abstract.  Nanoscale ridge apertures have been demonstrated to be applied for high-resolution lithography. We performed a numerical study of nanoscale bowtie apertures with different outline dimensions and gap sizes to analyze their detailed field distribution for near-field scanning optical lithography (NSOL). It is found that the high image contrast, which is necessary for good quality lithography, is obtained in the near-field region and decays quickly with increasing distance. Furthermore, a smaller gap size achieves higher image contrast and deeper depth of focus. With the NSOL system, static and scanning lithography experiments are conducted. Combined with the passive flexure stage for contact control, we achieved 18-nm lithography resolution.

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© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Li Ding ; Jin Qin ; Yang Chen and Liang Wang
"Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size", J. Micro/Nanolith. MEMS MOEMS. 15(3), 031611 (Sep 29, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.3.031611


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