Lithography

Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography

[+] Author Affiliations
Casey M. Schwarz, Chris N. Grabill, Gerald D. Richardson, Sherya Labh, Anna M. Lewis, Aadit Vyas

University of Central Florida, Department of Chemistry, Orlando, Florida, United States

Benn Gleason

University of Central Florida, CREOL, The College of Optics and Photonics, Orlando, Florida, United States

University of Clemson, Materials Science and Engineering Department, Clemson, South Carolina, United States

Clara Rivero-Baleine

Lockheed Martin, Orlando, Florida, United States

Kathleen A. Richardson

University of Central Florida, CREOL, The College of Optics and Photonics, Orlando, Florida, United States

Alexej Pogrebnyakov, Theresa S. Mayer

Pennsylvania State University, Department of Electrical Engineering, University Park, Pennsylvania, United States

Stephen M. Kuebler

University of Central Florida, Department of Chemistry, Orlando, Florida, United States

University of Central Florida, CREOL, The College of Optics and Photonics, Orlando, Florida, United States

University of Central Florida, Physics Department, Orlando, Florida, United States

J. Micro/Nanolith. MEMS MOEMS. 16(2), 023508 (Jun 19, 2017). doi:10.1117/1.JMM.16.2.023508
History: Received March 3, 2017; Accepted May 26, 2017
Text Size: A A A

Abstract.  A detailed study of multiphoton lithography (MPL) in arsenic trisulfide (As2S3) films and the effects on nanoscale morphology, chemical networking, and the appearance of the resulting features by the chemical composition, deposition rate, etch processing, and inclusion of an antireflection (AR) layer of As2Se3 between the substrate and the As2S3 layer is reported. MPL was used to photo-pattern nanostructured arrays in single- and multilayer films. The variation in chemical composition for laser-exposed, UV-exposed, and unexposed films is correlated with the etch response, nanostructure formation, and deposition conditions. Reflection of the focused beam at the substrate back into the film produces standing wave interference that modulates the exposure with distance from the substrate and produces nanobead structures. The interference and the modulation can be controlled by the addition of an AR layer of As2Se3 deposited between the substrate and the As2S3 film. Relative to structures produced in a single-layer As2S3 film having no AR layer, photo-patterning in the multilayer As2S3-on-As2Se3 film yields pillar-shaped structures that are closer to the targeted shape and are narrower (120 versus 320 nm), more uniform, and better adhering to the substrate. Processing methods are demonstrated for fabricating large-area arrays with diffractive optical function.

Figures in this Article
© 2017 Society of Photo-Optical Instrumentation Engineers

Citation

Casey M. Schwarz ; Chris N. Grabill ; Gerald D. Richardson ; Sherya Labh ; Anna M. Lewis, et al.
"Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography", J. Micro/Nanolith. MEMS MOEMS. 16(2), 023508 (Jun 19, 2017). ; http://dx.doi.org/10.1117/1.JMM.16.2.023508


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.