Characterization of CNT based pellicles for EUV lithography

Márcio Dias Lima; Takahiro Ueda; Tetsuo Harada; Mary Graham; Takeshi Kondo

doi:10.1117/12.2614061

13 June 2022 Characterization of CNT based pellicles for EUV lithography

Márcio Dias Lima, Takahiro Ueda, Tetsuo Harada, Mary Graham, Takeshi Kondo

Proceedings Volume PC12051, Optical and EUV Nanolithography XXXV; PC120510F (2022) https://doi.org/10.1117/12.2614061
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

Pellicles for EUV lithography manufactured using carbon nanotubes (CNT) films were characterized for EUV transmission, scattering, reflectivity, mechanical properties, and capability to stand high intensity (20 W/cm2) EUV radiation in environmental conditions similar to a EUV scanner. Full size (110 x 140 mm), free-standing pellicles less than 20 nm thick can be routinely manufactured using this type of CNT film. Concentration of contaminants such as catalyst particles is very small (< 0.5 wt.%). Several types of coated CNT films were also tested to increase the lifetime of the pellicles. Coating layers didn’t degrade mechanical strength significantly and even an improvement in rupture pressure and reduction of deflection under pressure was observed for some coatings. Coated films were capable of surviving a EUV dose equivalent to 32,000 wafers in a 600 W scanner. The EUV transmissions ranged from 97% for uncoated samples to 93% for coated. Scattering of uncoated samples was of only 0.15% a practically zero reflectance. The most promising coating increased scattering by a factor of 2.

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Citation Download Citation

Márcio Dias Lima, Takahiro Ueda, Tetsuo Harada, Mary Graham, and Takeshi Kondo "Characterization of CNT based pellicles for EUV lithography", Proc. SPIE PC12051, Optical and EUV Nanolithography XXXV, PC120510F (13 June 2022); https://doi.org/10.1117/12.2614061

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KEYWORDS

Extreme ultraviolet lithography

Pellicles

Coating

Scattering

Manufacturing

Reflectivity

Scanners

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