High-transparency pellicles for high-power EUV lithography

Márcio D. Lima; Takahiro Ueda; Takeshi Kondo; Tetsuo Harada

doi:10.1117/12.2641778

11 November 2022 High-transparency pellicles for high-power EUV lithography

Márcio D. Lima, Takahiro Ueda, Takeshi Kondo, Tetsuo Harada

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920F (2022) https://doi.org/10.1117/12.2641778
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Pellicles capable of withstanding the high beam intensity of next generation EUV scanners at the same time maintaining a EUV transmission above 90% and lifetime sufficient to produce 10 000 wafers or more represents a significant challenge from the materials point of view. In this presentation, pellicles manufactured using free-standing carbon nanotubes (CNT) films less than 20 nm thick were characterized for EUV transmission, scattering, reflectivity, mechanical properties, and capability to stand high intensity (30 W/cm2) EUV radiation in environmental conditions similar to a 600W EUV scanner. Several types of coated CNT films were also tested to increase the lifetime of the pellicles. The EUV transmissions ranged from 98% for uncoated samples to 95% for coated. Scattering up to 4.7 degrees was less than 0.1% for uncoated films and 0.2% for coated one.

Conference Presentation

Citation Download Citation

Márcio D. Lima, Takahiro Ueda, Takeshi Kondo, and Tetsuo Harada "High-transparency pellicles for high-power EUV lithography", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920F (11 November 2022); https://doi.org/10.1117/12.2641778

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KEYWORDS

Extreme ultraviolet lithography

Pellicles

Transparency

Scanners

Scattering

Carbon nanotubes

Extreme ultraviolet

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