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11 November 2022 Feasibility study of alternative multilayer for EUV mask
Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, Takahiro Onoue
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Proceedings Volume PC12293, Photomask Technology 2022; PC122930E (2022) https://doi.org/10.1117/12.2644225
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States
Abstract
The mask 3D effect of the EUV mask is key to implementing a high NA scanner process. This is attributed not only to the absorber but also to the multilayer films. Mo/Si multilayers are widely used for EUV masks. However, it may not have sufficient properties in terms of mask 3D effect. We have developed an alternative multilayer toward application to the high NA system. There are various factors that mask blanks affect wafer productivity. In this report, we evaluated durability performances. These evaluation results on the alternative multilayer will be presented and the next action will be discussed for future production.
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Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, and Takahiro Onoue "Feasibility study of alternative multilayer for EUV mask", Proc. SPIE PC12293, Photomask Technology 2022, PC122930E (11 November 2022); https://doi.org/10.1117/12.2644225
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KEYWORDS
Multilayers
Photomasks
Extreme ultraviolet
Extreme ultraviolet lithography
Reflectivity
Hydrogen
Laser scanners
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