Soft Vacuum Pulsed Electron Beam Processing Of Tenon And Teflon-Like Films

J. Krishnaswamy; G. J. Collins; H. Hiraoka

doi:10.1117/12.968539

1 August 1989 Soft Vacuum Pulsed Electron Beam Processing Of Tenon And Teflon-Like Films

J. Krishnaswamy, G. J. Collins, H. Hiraoka

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968539
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Poly(tetrafluoroethylene), Teflon, is an excellent engineering material with a low dielectric constant, chemical. inertness in hazardous environments, and thermal stability. However, it has many shortcomings such as poor adhesion to substrates, difficulty in micron-sized via hole fabrication, and almost zero solubility in common solvents. We found that Teflon self-developed very efficiently under pulsed electron beam (25 KV to 30 KV) exposure in soft vacuum. Teflon images were obtained by performing the electron exposure through a mask. its etching rate is the highest among the polymer films studied including radiation-sensitive poly(2-butene sulfone). A possible mechanism for this high self-development rate is proposed.

Citation Download Citation

J. Krishnaswamy, G. J. Collins, and H. Hiraoka "Soft Vacuum Pulsed Electron Beam Processing Of Tenon And Teflon-Like Films", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968539

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