Paper
4 March 2019 Comparative study between wet and dry etching of silicon for microchannels fabrication
G. A. Cirino, L. A. M. Barea, R. D. Mansano, P. Verdonck, A. von Zuben, N. C. Frateschi, J. A. Diniz
Author Affiliations +
Abstract
In this work we present a comparative study of two processes for the fabrication of an array of microchannels for microfluidics applications, based on integrated-circuit technology process steps, such as lithography and dry etching. Two different methods were investigated in order to study the resulting microstructures: wet and dry deep etching of silicon substrate. The typical etching depth necessary to the target application is 50 μm.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. A. Cirino, L. A. M. Barea, R. D. Mansano, P. Verdonck, A. von Zuben, N. C. Frateschi, and J. A. Diniz "Comparative study between wet and dry etching of silicon for microchannels fabrication", Proc. SPIE 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII, 1093015 (4 March 2019); https://doi.org/10.1117/12.2506804
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Dry etching

Wet etching

Etching

Aluminum

Photomasks

Semiconducting wafers

Back to Top