Update of the development progress of the high power LPP-EUV light source using a magnetic field

Atsushi Ueda; Shinji Nagai; Tsukasa Hori; Yutaka Shiraishi; Tatsuya Yanagida; Kenichi Miyao; Hideyuki Hayashi; Yukio Watanabe; Takeshi Okamoto; Tamotsu Abe; Takeshi Kodama; Hiroaki Nakarai; Takashi Saito; Hakaru Mizoguchi

doi:10.1117/12.2514809

26 March 2019 Update of the development progress of the high power LPP-EUV light source using a magnetic field

Atsushi Ueda, Shinji Nagai, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

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Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 109571S (2019) https://doi.org/10.1117/12.2514809
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volumemanufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO₂) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.

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Atsushi Ueda, Shinji Nagai, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Takashi Saito, and Hakaru Mizoguchi "Update of the development progress of the high power LPP-EUV light source using a magnetic field", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571S (26 March 2019); https://doi.org/10.1117/12.2514809

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