Paper
24 March 2017 Key components technology update of the 250W high-power LPP-EUV light source
Yasufumi Kawasuji, Krzysztof M. Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, Yutaka Shiraishi
Author Affiliations +
Abstract
13.5nm wavelength, CO2-Sn-LPP EUV light source which is the most promising solution for the source capable of enabling high-volume-manufacturing of semiconductor devices with critical layers patterned with sub-10nm resolution. Our source incorporates unique and original technologies such as; high power short pulse CO2 laser, short wavelength solid-state pre-pulse laser, highly stabilized droplet generator, a laser-droplet shooting control system and debris mitigation technology utilizing a strong magnetic field. In this paper we present a technology update on the key components of our 250W CO2-Sn-LPP EUV light source.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasufumi Kawasuji, Krzysztof M. Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, and Yutaka Shiraishi "Key components technology update of the 250W high-power LPP-EUV light source", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101432G (24 March 2017); https://doi.org/10.1117/12.2257808
Lens.org Logo
CITATIONS
Cited by 10 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

Gas lasers

Carbon monoxide

Light sources

Tin

Pulsed laser operation

Laser applications

RELATED CONTENT

Performance of new high-power HVM LPP-EUV source
Proceedings of SPIE (March 18 2016)
Performance of 250W high-power HVM LPP-EUV source
Proceedings of SPIE (March 27 2017)
Development of 250W EUV light source for HVM lithography
Proceedings of SPIE (February 22 2017)
LPP-EUV light source for HVM lithography
Proceedings of SPIE (January 13 2017)
CO2 laser produced Sn plasma as the solution for high...
Proceedings of SPIE (September 13 2007)

Back to Top