Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size

Takuya Isono; Kohei Yoshida; Hiroaki Mamiya; Ken Miyagi; Akiyoshi Yamazaki; Toshifumi Satoh

doi:10.1117/12.2515933

25 March 2019 Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size

Takuya Isono, Kohei Yoshida, Hiroaki Mamiya, Ken Miyagi, Akiyoshi Yamazaki, Toshifumi Satoh

Author Affiliations +

Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 109600U (2019) https://doi.org/10.1117/12.2515933
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

This paper describes the ester-amide exchange reaction for the facile and efficient post-polymerization modification of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) to produce high-χ/low-N PS-b-PMMA analogues that exhibit a microphase separation with features on a sub-10 nm scale. Various amines were used for the ester-amide exchange reaction to introduce a small number of methacrylamide units into the PMMA block of the parent PS-b- PMMA. A small-angle X-ray scattering analysis revealed that a tiny amount of the methacrylamide units led to a significant increase in the incompatibility between the blocks. Consequently, we obtained a lamellar microphaseseparated structure with a domain-spacing as small as 11.1 nm through the simple post-polymerization modification of low-molecular-weight PS-b-PMMA. More importantly, directed self-assembly for the modified PS-b-PMMAs was demonstrated using topographically prepatterned silicon substrates with a PS brush layer, thus highlighting the practical utility of the proposed method in next generation nanolithographic applications.

Citation Download Citation

Takuya Isono, Kohei Yoshida, Hiroaki Mamiya, Ken Miyagi, Akiyoshi Yamazaki, and Toshifumi Satoh "Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109600U (25 March 2019); https://doi.org/10.1117/12.2515933

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available