A smart litho friendly design method to enable fast lithography hotspots detection in design flow

Xiaolong Ma; Yanxiang Liu; Xinyi Hu; Qijian Wan; Zhengfang Liu; Chunshan Du; Liguo Zhang

doi:10.1117/12.2515135

20 March 2019 A smart litho friendly design method to enable fast lithography hotspots detection in design flow

Xiaolong Ma, Yanxiang Liu, Xinyi Hu, Qijian Wan, Zhengfang Liu, Chunshan Du, Liguo Zhang

Proceedings Volume 10962, Design-Process-Technology Co-optimization for Manufacturability XIII; 1096215 (2019) https://doi.org/10.1117/12.2515135
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

When technology comes to 28nm and beyond, chip size and design complexity are increasing. Lithography simulation is computing intensive and it may takes days to see whether there is any hotspot hard to solve other than change the design. Pattern classification is quite a matured technique and it can be used to locate unique patterns on a chip, then it is possible to do lithography simulation on these unique pattern locations first. This is an efficient approach to quickly detect any unfriendly design style on the layout and give designers enough time to fix these unfriendly designs and do an incremental check to validate the fixing. Once the fixing approach is validated, a pattern matching based pattern substitution can be used to fix all the problematic areas on the layout.

Citation Download Citation

Xiaolong Ma, Yanxiang Liu, Xinyi Hu, Qijian Wan, Zhengfang Liu, Chunshan Du, and Liguo Zhang "A smart litho friendly design method to enable fast lithography hotspots detection in design flow", Proc. SPIE 10962, Design-Process-Technology Co-optimization for Manufacturability XIII, 1096215 (20 March 2019); https://doi.org/10.1117/12.2515135

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