Absolute coordinate system adjustment and calibration by using standalone alignment metrology system

Satoshi Ando; Haruki Saito; Sayuri Tanaka; Tetsuya Kawata; Takanobu Okamoto; Katsushi Makino; Yuji Shiba; Takehisa Yahiro; Jun Ishikawa; Masahiro Morita

doi:10.1117/12.2583695

22 February 2021 Absolute coordinate system adjustment and calibration by using standalone alignment metrology system

Satoshi Ando, Haruki Saito, Sayuri Tanaka, Tetsuya Kawata, Takanobu Okamoto, Katsushi Makino, Yuji Shiba, Takehisa Yahiro, Jun Ishikawa, Masahiro Morita

Author Affiliations +

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 116112S (2021) https://doi.org/10.1117/12.2583695
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

We propose a construction and calibration method of an absolute coordinate system for lithography tools. In the conventional overlay control system, subsequent layers are overlaid on the 1st layer that could have unknown wafer distortion. This is inefficient, because the distortion of the 1st layer may be large. A high-level overlay control can be realized with the absolute coordinate system by correcting the 1st layer to zero distortion. This can be possible by using absolute alignment metrology system. In order to confirm our theory, we report experimental results of the absolute grid construction and matching accuracy among multiple lithography tools.

Conference Presentation

Citation Download Citation

Satoshi Ando, Haruki Saito, Sayuri Tanaka, Tetsuya Kawata, Takanobu Okamoto, Katsushi Makino, Yuji Shiba, Takehisa Yahiro, Jun Ishikawa, and Masahiro Morita "Absolute coordinate system adjustment and calibration by using standalone alignment metrology system", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116112S (22 February 2021); https://doi.org/10.1117/12.2583695

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