Benefits of SEM field-of-view contour averaging for contour-based MPC modeling

Kushlendra Mishra; Rachit Sharma; Ingo Bork; Zhiheng (Mary) Zuo; Mark Pereira; Samir Bhamidipati; Seshadri Rampoori

doi:10.1117/12.2641833

1 December 2022 Benefits of SEM field-of-view contour averaging for contour-based MPC modeling

Kushlendra Mishra, Rachit Sharma, Ingo Bork, Zhiheng (Mary) Zuo, Mark Pereira, Samir Bhamidipati, Seshadri Rampoori

Proceedings Volume 12293, Photomask Technology 2022; 122930H (2022) https://doi.org/10.1117/12.2641833
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Building accurate models for Mask Process Correction (MPC) is indispensable for manufacturing masks for advanced wafer production nodes. In recent years, contour-based model calibration is being increasingly studied as a supplement to standard gauge-based modeling. In this paper, we demonstrate a data processing flow for contour calibration of MPC models to overcome the issue of noisy input contours by averaging the measured contours of repeating patterns within the SEM image field-of-view (FOV). This method not only averages out the statistical noise in the incoming FOV contours, but also allows us to make the model calibration process more efficient.

Conference Presentation

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Kushlendra Mishra, Rachit Sharma, Ingo Bork, Zhiheng (Mary) Zuo, Mark Pereira, Samir Bhamidipati, and Seshadri Rampoori "Benefits of SEM field-of-view contour averaging for contour-based MPC modeling", Proc. SPIE 12293, Photomask Technology 2022, 122930H (1 December 2022); https://doi.org/10.1117/12.2641833

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