Paper
1 November 1993 Long-wavelength infrared doping-spike PtSi detector
True Lon Lin, Jin Suk Park, Sarath D. Gunapala, Eric W. Jones, Hector M. Del Castillo
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Abstract
By incorporating a 1-nm-thick p+ doping spike at the PtSi/Si interface, we have successfully demonstrated extended cutoff wavelengths of PtSi Schottky infrared detectors in the long wavelength infrared (LWIR) regime for the first time. The extended cutoff wavelengths resulted from the combined effects of an increased electric field near the silicide/Si interface due to the p+ doping spike and the Schottky image force. The p+ doping spikes were grown by molecular beam epitaxy at 450 degree(s)C using elemental boron as the dopant source, with doping concentrations ranging from 5 X 1019 to 2 X 1020 cm-3. Transmission electron microscopy indicated good crystalline quality of the doping spikes. The cutoff wavelengths were shown to increase with increasing doping concentrations of the p+ spikes. Thermionic emission dark current characteristics were observed and photoresponse in the LWIR regime was demonstrated.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
True Lon Lin, Jin Suk Park, Sarath D. Gunapala, Eric W. Jones, and Hector M. Del Castillo "Long-wavelength infrared doping-spike PtSi detector", Proc. SPIE 2020, Infrared Technology XIX, (1 November 1993); https://doi.org/10.1117/12.160558
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Cited by 5 scholarly publications.
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KEYWORDS
Doping

Sensors

Long wavelength infrared

Infrared sensors

Silicon

Infrared detectors

Boron

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