CMOS resonant sensors

Oliver Brand; Mark Hornung; Dirk Lange; Henry Baltes

doi:10.1117/12.323895

8 September 1998 CMOS resonant sensors

Oliver Brand, Mark Hornung, Dirk Lange, Henry Baltes

Proceedings Volume 3514, Micromachined Devices and Components IV; (1998) https://doi.org/10.1117/12.323895
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States

Abstract

This paper focuses on CMOS resonant sensors, i.e., resonant sensors fabricated with CMOS technology in combination with compatible micromachining steps. After reviewing resonant sensor principles, micromachining techniques applicable to CMOS resonant sensors are discussed. Subsequently, different excitation and detection mechanisms for silicon-based resonant sensors are compared. Finally, three examples of CMOS resonant microsensors, namely, an ultrasound proximity sensor, a chemical sensor and a vacuum sensor are discussed.

Citation Download Citation

Oliver Brand, Mark Hornung, Dirk Lange, and Henry Baltes "CMOS resonant sensors", Proc. SPIE 3514, Micromachined Devices and Components IV, (8 September 1998); https://doi.org/10.1117/12.323895

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