Paper
16 April 1998 Micromachining for silicon microaccelerometer
Kunchinadka Narayana Hari Bhat
Author Affiliations +
Proceedings Volume 3321, 1996 Symposium on Smart Materials, Structures, and MEMS; (1998) https://doi.org/10.1117/12.305558
Event: Smart Materials, Structures and MEMS, 1996, Bangalore, India
Abstract
In this paper, the concepts of `bulk' and `surface' micromachining are first presented. The fabrication techniques for realizing silicon microaccelerometer using these two approaches are next presented. In both the cases, the acceleration is measured by detecting the change in the capacitance due to the deflection of an inertial mass called seismic mass or proof mass with respect to fixed plates. The relative merits of the two approaches are presented to allow that in spite of the simplicity and low cost nature of bulk micromachining, the surface micromachining has gained popularity because of its versatility and suitability for integrating the surface micromachined sensors with the integrated circuits.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunchinadka Narayana Hari Bhat "Micromachining for silicon microaccelerometer", Proc. SPIE 3321, 1996 Symposium on Smart Materials, Structures, and MEMS, (16 April 1998); https://doi.org/10.1117/12.305558
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KEYWORDS
Etching

Silicon

Semiconducting wafers

Surface micromachining

Anisotropic etching

Bulk micromachining

Electrodes

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