Paper
26 July 1999 Experimental comparison of off-axis illumination and imaging interferometric lithography
Xiaolan Chen, Steven R. J. Brueck
Author Affiliations +
Abstract
Imaging interferometric lithography (IIL) is a newly developed technology extending the resolution of optical lithography (OL) to the linear-systems limits of optics. IIL is an extension of off-axis illumination (OAI) for offset angles larger than the numerical aperture (NA) of the optical system. In this work, the connection of IIL with quadruple OAI is demonstrated by reduction the offset angle to within the optical system NA. This gives rise to an effective optical transfer function that decreases at higher spatial frequencies since multiple counting of the lower frequency space components emphasizes the low-frequency response. Pupil plane filters are introduced to eliminate this multiple coverage and improve the pattern fidelity. Simulation results are in excellent agreement with the experiments, reproducing even the fine pattern details. Tiling of spatial frequency space with different pupil plane filters for both OAI and IIL approaches has also been investigated. Pattern fidelity is significantly affected by the tiling scheme with the IL approach yielding the most robust overall image performance.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaolan Chen and Steven R. J. Brueck "Experimental comparison of off-axis illumination and imaging interferometric lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354390
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KEYWORDS
Spatial frequencies

Lithography

Imaging systems

Cadmium

Modulation transfer functions

Interferometry

Photomasks

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