Intrawafer CD control in state-of-the-art lithography

Ivan K.A. Pollentier; Christiaan Baert; Thomas Marschner; Kurt G. Ronse; Grozdan Grozev; Mario Reybrouck

doi:10.1117/12.354406

26 July 1999 Intrawafer CD control in state-of-the-art lithography

Ivan K.A. Pollentier, Christiaan Baert, Thomas Marschner, Kurt G. Ronse, Grozdan Grozev, Mario Reybrouck

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354406
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In this work, die-to-die CD-variations across a wafer are investigated as a potential important contribution to the global gate CD-control. Measuring the non-uniformity in different experiments using CD-SEM and ELM revealed different parameters, impacting the measured non-uniformity value. It will be pointed out that the measurement itself can have a significant contribution to the measured 3(sigma) -value, especially using CD-SEM, if the level in non-uniformity is low. Further on, it will be shown that the choice of resist and developer chemistry can have a high impact on the i-W CD non-uniformity. Moreover, the potential impact of exposure and track processing will be outlined, and an optimization methodology will be presented. Finally, it will be shown that gate process integration, in particular BARC- and POLY-etching, is increasing the i-W CD non-uniformity. This is affecting the ELM-results, despite the high precision and repeatability of these measurements. This ELM-variation, as well as the overall i-W CD non- uniformity should be taken into account when using ELM or CD-SEM as a metrology tool for process window characterization.

Citation Download Citation

Ivan K.A. Pollentier, Christiaan Baert, Thomas Marschner, Kurt G. Ronse, Grozdan Grozev, and Mario Reybrouck "Intrawafer CD control in state-of-the-art lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354406

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available