Mechanism of deep-UV photoresist tail on inorganic antireflective layer film

Seung-Jae Lee; Su Geun Lee; Min Kim; Sun-Hoo Park; Jeong-Lim Nam; Sang-In Lee

doi:10.1117/12.436756

22 August 2001 Mechanism of deep-UV photoresist tail on inorganic antireflective layer film

Seung-Jae Lee, Su Geun Lee, Min Kim, Sun-Hoo Park, Jeong-Lim Nam, Sang-In Lee

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436756
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

As the minimum feature size decreases down to 0.20micrometers , a minute pattern deformation can result in serious critical dimension variation. To minimize the critical dimension variation, the interaction of the positive-tone chemical amplification resist with SiOxNy type inorganic anti-reflective layer is investigated. The surface characterization of inorganic anti-reflective layer reveals that Si-NHx(x=0,1,2) and Si-N=O groups are attributed to the cause of the DUV PR footing. Based on the analyses, the technique to reduce the pattern deformation of the chemical amplification resist on inorganic anti-reflective layer is suggested.

Citation Download Citation

Seung-Jae Lee, Su Geun Lee, Min Kim, Sun-Hoo Park, Jeong-Lim Nam, and Sang-In Lee "Mechanism of deep-UV photoresist tail on inorganic antireflective layer film", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436756

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