High-resolution 157-nm imaging for lithography and micromachining applications

Malcolm C. Gower; Julian S. Cashmore; Michael D. Whitfield; Philipp Gruenewald

doi:10.1117/12.456887

25 February 2002 High-resolution 157-nm imaging for lithography and micromachining applications

Malcolm C. Gower, Julian S. Cashmore, Michael D. Whitfield, Philipp Gruenewald

Proceedings Volume 4426, Second International Symposium on Laser Precision Microfabrication; (2002) https://doi.org/10.1117/12.456887
Event: Second International Symposium on Laser Precision Micromachining, 2001, Singapore, Singapore

Abstract

A Microstepper exposure tool for high-resolution imaging applications incorporating the F₂ 157nm laser is described. Details are presented of the optical architecture including beams shaping, homogenization and imaging objectives. Results from the high-resolution metrology, workpiece positioning and gas purging subsystems used in the tool are discussed. Use of the Microstepper for 70nm-node deep-iv lithography and submicron micromachining applications is presented.

Citation Download Citation

Malcolm C. Gower, Julian S. Cashmore, Michael D. Whitfield, and Philipp Gruenewald "High-resolution 157-nm imaging for lithography and micromachining applications", Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); https://doi.org/10.1117/12.456887

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