Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

Vladimir Liberman; Mordechai Rothschild; Stephen T. Palmacci; N. N. Efremow Jr.; Jan H. C. Sedlacek; A. Grenville

doi:10.1117/12.474552

30 July 2002 Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Stephen T. Palmacci, N. N. Efremow Jr., Jan H. C. Sedlacek, A. Grenville

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474552
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Long-term durability tests of optical thin films and thin films designed for attenuating phase shifters have been performed in a chamber, which stresses clean protocols to eliminate extraneous effects of surface contamination. Most anti-reflective coatings tend to degrade several percent in transmission within 1 MJ/cm2 total dose. Attenuating phase shifting materials usually show an increase in transmission during 6 kJ/cm2. In both types of films there are exceptions, indicating that there are no fundamental causes that would limit the performance of such films. A new phenomenon of laser-induced surface damage in calcium fluoride has been observed, and is being studied.

Citation Download Citation

Vladimir Liberman, Mordechai Rothschild, Stephen T. Palmacci, N. N. Efremow Jr., Jan H. C. Sedlacek, and A. Grenville "Long-term laser durability testing of optical coatings and thin films for 157-nm lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474552

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