Metrology delay time reduction in lithography via small-lot wafer transport

Vinay K. Shah; Eric A. Englhardt; Sushant Koshti; Helen R. Armer

doi:10.1117/12.657964

24 March 2006 Metrology delay time reduction in lithography via small-lot wafer transport

Vinay K. Shah, Eric A. Englhardt, Sushant Koshti, Helen R. Armer

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61523J (2006) https://doi.org/10.1117/12.657964
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A small lot Automated Material Handling System (AMHS) is presented as a method to reduce the time between wafer exposure at a photolithography tool and collection of metrology / inspection data. A new AMHS system that is capable of the move rates required by small lot wafer transport is described, its implementation in a photolithography bay is explained, and the resulting reduction in metrology delay time is quantified. In addition, a phased implementation approach is described in which some, but not all, components of the new AMHS would be installed in existing fabs to enhance the move rate capability of traditional overhead transport (OHT) AMHS systems. This partial implementation would enable a partial lot size reduction and corresponding metrology delay time reduction of 60-70%. The full AMHS solution would be installed in new fabs and enable true small lot manufacturing in the litho area and would result in the maximum delay time reduction of 75-85%.

Citation Download Citation

Vinay K. Shah, Eric A. Englhardt, Sushant Koshti, and Helen R. Armer "Metrology delay time reduction in lithography via small-lot wafer transport", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523J (24 March 2006); https://doi.org/10.1117/12.657964

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