Rigorous simulation of 3D masks

Sven Burger; Roderick Köhle; Lin Zschiedrich; Hoa Nguyen; Frank Schmidt; Reinhard März; Christoph Nölscher

doi:10.1117/12.687816

20 October 2006 Rigorous simulation of 3D masks

Sven Burger, Roderick Köhle, Lin Zschiedrich, Hoa Nguyen, Frank Schmidt, Reinhard März, Christoph Nölscher

Proceedings Volume 6349, Photomask Technology 2006; 63494Z (2006) https://doi.org/10.1117/12.687816
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

We perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size 9μm x 4μm x 65nm. On this relatively large computational domain we perform rigorous computations (No Hopkins) taking into account a grid of 11 x 21 source points with two polarization directions each. We obtain well converged results with an accuracy of the diffraction orders of about 1%. The results compare well to experimental aerial imaging results. We further investigate the convergence of 3D solutions towards quasi-exact results obtained with different methods.

Citation Download Citation

Sven Burger, Roderick Köhle, Lin Zschiedrich, Hoa Nguyen, Frank Schmidt, Reinhard März, and Christoph Nölscher "Rigorous simulation of 3D masks", Proc. SPIE 6349, Photomask Technology 2006, 63494Z (20 October 2006); https://doi.org/10.1117/12.687816

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