Dr. Christoph Noelscher Profile

Dr. Christoph Noelscher

Senior Staff Expert at Carl Zeiss SMT AG

SPIE Involvement:

Author

Publications (18)

SPIE Journal Paper | 1 January 2009

Double patterning down to k₁=0.15 with litho trim

Christoph Noelscher, Marcel Heller, Matthias Markert, Dietmar Temmler, Franck Jauzion-Graverolle, Nicolo Morgana, Ulrich Scheler, Bee-Kim Hong, Ulrich Egger, Vadim Timoshkov, Mirko Vogt

JM3, Vol. 8, Issue 01, 011005, (January 2009) https://doi.org/10.1117/12.10.1117/1.3066296

KEYWORDS: Etching, Double patterning technology, Critical dimension metrology, Amorphous silicon, Lithography, Scanning electron microscopy, Photomasks, Image processing, Cadmium, Silicon

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Proceedings Article | 2 May 2008 Paper

Paper

Assessment and application of focus drilling for DRAM contact hole fabrication

Christoph Noelscher, Franck Jauzion-Graverolle, Thomas Henkel

Proceedings Volume 6792, 67920Q (2008) https://doi.org/10.1117/12.798807

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photomasks, Lithography, Optical fiber cables, Colorimetry, Chromatic aberrations, Computer aided design, Calibration, Scanners

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Proceedings Article | 1 April 2008 Paper

Paper

AltPSM contact hole application at DRAM 4xnm nodes with dry 193nm lithography

Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer

Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806

KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

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Proceedings Article | 7 March 2008 Paper

Paper

Double patterning down to k1=0.15 with bilayer resist

Christoph Noelscher, Franck Jauzion-Graverolle, Marcel Heller, Matthias Markert, Bee-Kim Hong, Ulrich Egger, Dietmar Temmler

Proceedings Volume 6924, 69240Q (2008) https://doi.org/10.1117/12.772750

KEYWORDS: Etching, Amorphous silicon, Semiconducting wafers, Lithography, Double patterning technology, Critical dimension metrology, Optical lithography, 193nm lithography, Photomasks, Image processing

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Proceedings Article | 30 October 2007 Paper

Paper

EMF simulations of isolated and periodic 3D photomask patterns

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Bernd Küchler, Christoph Nölscher

Proceedings Volume 6730, 67301W (2007) https://doi.org/10.1117/12.746392

KEYWORDS: Finite element methods, Photomasks, Computer simulations, Critical dimension metrology, Near field, Chemical elements, Light scattering, Chromium, Optical lithography, Electromagnetism

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Proceedings Article | 18 June 2007 Paper

Paper

3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method

Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Thomas Henkel, Bernd Küchler, Christoph Nölscher

Proceedings Volume 6617, 66170V (2007) https://doi.org/10.1117/12.726236

KEYWORDS: Etching, Diffraction, Finite element methods, Photomasks, Computer simulations, Chemical elements, Electromagnetism, Optical lithography, Nanostructures, Radio propagation

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Proceedings Article | 26 March 2007 Paper

Paper

Optimal SRAF placement for process window enhancement in 65-nm/45-nm technology

Chandra Sarma, Klaus Herold, Christoph Noelscher, Paul Schroeder

Proceedings Volume 6520, 65202B (2007) https://doi.org/10.1117/12.711480

KEYWORDS: SRAF, Photomasks, Tolerancing, Semiconducting wafers, Printing, Manufacturing, Lithography, Optical proximity correction, Logic, Standards development

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Proceedings Article | 20 October 2006 Paper

Paper

Rigorous simulation of 3D masks

Sven Burger, Roderick Köhle, Lin Zschiedrich, Hoa Nguyen, Frank Schmidt, Reinhard März, Christoph Nölscher

Proceedings Volume 6349, 63494Z (2006) https://doi.org/10.1117/12.687816

KEYWORDS: Finite element methods, Chemical elements, Photomasks, Computer simulations, Lithography, Image processing, Diffraction, Polarization, Airborne remote sensing, Photoresist processing

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Proceedings Article | 5 November 2005 Paper

Paper

Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask

Thomas Henkel, Martin Sczyrba, Christoph Noelscher

Proceedings Volume 5992, 59925G (2005) https://doi.org/10.1117/12.634349

KEYWORDS: Photomasks, Critical dimension metrology, 3D modeling, Error analysis, Calibration, Phase shifting, 3D acquisition, Lithography, Scanners, Semiconducting wafers

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Proceedings Article | 5 November 2005 Paper

Paper

Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation

Sven Burger, Roderick Köhle, Lin Zschiedrich, Weimin Gao, Frank Schmidt, Reinhard März, Christoph Nölscher

Proceedings Volume 5992, 599216 (2005) https://doi.org/10.1117/12.631696

KEYWORDS: Finite element methods, Photomasks, Computer simulations, Diffraction, Finite-difference time-domain method, Polarization, Chemical elements, Solids, Waveguides, Lithography

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SPIE Journal Paper | 1 October 2005

New stochastic post-exposure bake simulation method

Thomas Mülders, Wolfgang Henke, Klaus Elian, Christoph Nölscher, Michael Sebald

JM3, Vol. 4, Issue 04, 043010, (October 2005) https://doi.org/10.1117/12.10.1117/1.2136867

KEYWORDS: Molecules, Stochastic processes, Diffusion, Particles, Computer simulations, Line edge roughness, Printing, Process modeling, Solids, Computing systems

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Proceedings Article | 14 May 2004 Paper

Paper

Methodology and practical application of an ArF resist model calibration

Ralf Ziebold, Bernd Kuchler, Christoph Nolscher, Martin Robiger, Klaus Elian, Bernd Tollkuhn

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536343

KEYWORDS: Calibration, Data modeling, Photomasks, Lithography, 3D modeling, Semiconducting wafers, Optimization (mathematics), Diffractive optical elements, Computer simulations, Diffusion

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Proceedings Article | 14 May 2004 Paper

Paper

Do we need complex resist models for predictive simulation of lithographic process performance?

Bernd Tollkuhn, Andreas Erdmann, Jeroen Lammers, Christoph Nolscher, Armin Semmler

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534045

KEYWORDS: Finite element methods, Calibration, Data modeling, Photomasks, Diffusion, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, Photoresist processing, Optimization (mathematics)

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Proceedings Article | 14 September 2001 Paper

Paper

Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks

Armin Semmler, Leonhard Mader, Annika Elsner, Roderick Koehle, Uwe Griesinger, Christoph Noelscher

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435735

KEYWORDS: Photomasks, Etching, Information operations, Critical dimension metrology, Manufacturing, Phase shifting, Chromium, Phase shifts, Lithography, Optical proximity correction

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Proceedings Article | 14 September 2001 Paper

Paper

Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification

Armin Semmler, Annika Elsner, Roderick Koehle, Leonhard Mader, Rainer Pforr, Christoph Noelscher, Christoph Friedrich, Juergen Knobloch, Uwe Griesinger

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435773

KEYWORDS: Photomasks, Phase shifts, Lithography, Phase shifting, Optical lithography, Optical proximity correction, 3D metrology, Resolution enhancement technologies, 3D image processing, Diffraction

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Proceedings Article | 22 January 2001 Paper

Paper

Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification

Uwe Griesinger, Leonhard Mader, Armin Semmler, Wolfgang Dettmann, Christoph Noelscher, Rainer Pforr

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410714

KEYWORDS: Etching, Phase measurement, Photomasks, Phase shifts, Chromium, Calibration, 3D metrology, Quartz, Profiling, Error analysis

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Proceedings Article | 1 July 1991 Paper

Paper

Investigation of self-aligned phase-shifting reticles by simulation techniques

Christoph Noelscher, Leonhard Mader

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44798

KEYWORDS: Reticles, Phase shifts, Optical lithography, Photomasks, Tolerancing, Manufacturing, Solids, Lithography, Critical dimension metrology, Lab on a chip

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Proceedings Article | 1 June 1991 Paper

Paper

Application aspects of the Si-CARL bilayer process

Michael Sebald, Joerg Berthold, Michael Beyer, Rainer Leuschner, Christoph Noelscher, Ulrich Scheler, Recai Sezi, Hellmut Ahne, Siegfried Birkle

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46374

KEYWORDS: Polymers, Semiconducting wafers, Deep ultraviolet, Photoresist processing, Etching, Lithography, Silicon, Plasma, Picture Archiving and Communication System, Oxygen

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Showing 5 of 18 publications

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