Modeling and performance metrics for longitudinal chromatic aberrations, focus-drilling, and Z-noise: exploring excimer laser pulse-spectra

Mark Smith; Joseph Bendik; Ivan Lalovic; Nigel Farrar; William Howard; Chris Sallee

doi:10.1117/12.714102

27 March 2007 Modeling and performance metrics for longitudinal chromatic aberrations, focus-drilling, and Z-noise: exploring excimer laser pulse-spectra

Mark Smith, Joseph Bendik, Ivan Lalovic, Nigel Farrar, William Howard, Chris Sallee

Author Affiliations +

Proceedings Volume 6520, Optical Microlithography XX; 65203E (2007) https://doi.org/10.1117/12.714102
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The combined impact of longitudinal chromatic aberrations, focus-drilling, and Z-noise on several lithographic performance metrics is described. After review, we investigate an improved method for simulating the lithographic behavior of longitudinal chromatic aberrations stemming from the finite bandwidth of excimer laser pulse-spectra using PROLITH^TM v. 9.3.3. Additionally, we explore two methods for modeling the lithographic improvements related to focus-drilling and new PROLITH functionality for modeling the effects of Z-noise. Our case studies involve reinvestigating the RELAX process and providing a framework for accurate lithographic simulation using machine specific pulse-spectral data, modified Lorentzian, and Gaussian models. After presentation and analysis, we discuss potential applications including methods for improved focus budgets and improved mask design.

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Mark Smith, Joseph Bendik, Ivan Lalovic, Nigel Farrar, William Howard, and Chris Sallee "Modeling and performance metrics for longitudinal chromatic aberrations, focus-drilling, and Z-noise: exploring excimer laser pulse-spectra", Proc. SPIE 6520, Optical Microlithography XX, 65203E (27 March 2007); https://doi.org/10.1117/12.714102

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