Resolution, LER, and sensitivity limitations of photoresists

Gregg M. Gallatin; Patrick Naulleau; Dimitra Niakoula; Robert Brainard; Elsayed Hassanein; Richard Matyi; Jim Thackeray; Kathleen Spear; Kim Dean

doi:10.1117/12.772763

21 March 2008 Resolution, LER, and sensitivity limitations of photoresists

Gregg M. Gallatin, Patrick Naulleau, Dimitra Niakoula, Robert Brainard, Elsayed Hassanein, Richard Matyi, Jim Thackeray, Kathleen Spear, Kim Dean

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69211E (2008) https://doi.org/10.1117/12.772763
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Recent experimental results and modeling both indicate that whereas it is possible to optimize a photoresist and process to achieve separately a desired resolution or line edge roughness or sensitivity, it will be difficult if not impossible to achieve all three simultaneously using current standard chemically amplified photoresists and processes. This tradeoff among Resolution, Line Edge Roughness (LER) and Sensitivity is termed the RLS tradeoff. Here we review the progress to date of a SEMATECH-funded program to develop an experimentally verified model of the relationship among resolution, LER and sensitivity and use it to determine approaches for "breaking" the RLS tradeoff.

Citation Download Citation

Gregg M. Gallatin, Patrick Naulleau, Dimitra Niakoula, Robert Brainard, Elsayed Hassanein, Richard Matyi, Jim Thackeray, Kathleen Spear, and Kim Dean "Resolution, LER, and sensitivity limitations of photoresists", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211E (21 March 2008); https://doi.org/10.1117/12.772763

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