PML2: the maskless multibeam solution for the 22nm node and beyond

C. Klein; E. Platzgummer; J. Klikovits; W. Piller; H. Loeschner; T. Bejdak; P. Dolezel; V. Kolarik; W. Klingler; F. Letzkus; J. Butschke; M. Irmscher; M. Witt; W. Pilz; P. Jaschinsky; F. Thrum; C. Hohle; J. Kretz; J. T. Nogatch; A. Zepka

doi:10.1117/12.813670

18 March 2009 PML2: the maskless multibeam solution for the 22nm node and beyond

C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J. T. Nogatch, A. Zepka

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72710N (2009) https://doi.org/10.1117/12.813670
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Projection Mask-Less Lithography (PML2) is a potentially cost-effective multi electron-beam solution for the 22 nm half-pitch node and beyond. PML2 is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel, thereby pushing the potential throughput into the wafers per hour regime. With resolution potential of < 10 nm, PML2 is designed to meet the requirements of several upcoming tool generations.

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C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J. T. Nogatch, and A. Zepka "PML2: the maskless multibeam solution for the 22nm node and beyond", Proc. SPIE 7271, Alternative Lithographic Technologies, 72710N (18 March 2009); https://doi.org/10.1117/12.813670

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