Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity

Sherjang Singh; Kenji Onuki; Naoshi Kawamata; Takaharu Nagai; Masaaki Kurihara; Tatsuya Tomita; Naoya Hayashi; Peter Dress; Uwe Dietze

doi:10.1117/12.898649

13 October 2011 Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity

Sherjang Singh, Kenji Onuki, Naoshi Kawamata, Takaharu Nagai, Masaaki Kurihara, Tatsuya Tomita, Naoya Hayashi, Peter Dress, Uwe Dietze

Author Affiliations +

Proceedings Volume 8166, Photomask Technology 2011; 81662P (2011) https://doi.org/10.1117/12.898649
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

Nano-Imprint Lithography (NIL) is considered a promising alternative to optical lithography for technology nodes at 22nm hp and beyond. Compared to other advanced and complex lithography methods, NIL processing is simple and inexpensive making it a widely accepted technology for pattern media and a potential cost effective alternative for CMOS applications. During the NIL process, the template comes into direct contact with the resist on the substrate and consequently template cleanliness plays a decisive role in imprinted substrate quality. Furthermore, if the template has any form of a defect such as resist residue, stains, particles, surface scratches, chipping and bumping etc. it can lead to poor quality imprints, low yield and throughput decreases. The latest ITRS roadmap has stringent CD, CD uniformity, surface roughness and defect control requirements for NIL templates. Any template cleaning process that is adopted must be able to remove defects while maintaining the critical parameters outlined by the ITRS. Aggressive chemistries (such as NH4OH or SC1 (NH₄OH+H₂O₂+DI) and strong physical force treatments (such as MegaSonic & Binary Sprays) may cause damage to the template if not optimized. This paper presents the cleaning chemical effects on template surface roughness and CD at varying concentrations. The effect of physical force cleaning on fragile and sensitive pattern features is also presented. Particle & imprint resist removal efficacy at different process conditions is compared.

Citation Download Citation

Sherjang Singh, Kenji Onuki, Naoshi Kawamata, Takaharu Nagai, Masaaki Kurihara, Tatsuya Tomita, Naoya Hayashi, Peter Dress, and Uwe Dietze "Effects of cleaning on NIL templates: surface roughness, CD, and pattern integrity", Proc. SPIE 8166, Photomask Technology 2011, 81662P (13 October 2011); https://doi.org/10.1117/12.898649

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available