Contamination concerns at the intermediate focus of an extreme ultraviolet light source

David N. Ruzic; John Sporre; Dan Elg; Davide Curreli

doi:10.1117/12.2011612

1 April 2013 Contamination concerns at the intermediate focus of an extreme ultraviolet light source

David N. Ruzic, John Sporre, Dan Elg, Davide Curreli

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 86790D (2013) https://doi.org/10.1117/12.2011612
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

The emission of species that can chemically or physically alter the surface of post intermediate-focus optics will increase the cost of ownership of such an EUV lithography tool past the point of cost effectiveness. To address this concern, the Center for Plasma-Material Interactions has developed the Sn Intermediate Focus Flux Emission Detector (SNIFFED). The effects of increasing buffer gas, increasing pressure, and chosen buffer gas species will be presented. Furthermore the presence of a secondary plasma, generated by EUV light will be analyzed and exposed as a potential issue in the strive for a contaminant free intermediate focus.

Citation Download Citation

David N. Ruzic, John Sporre, Dan Elg, and Davide Curreli "Contamination concerns at the intermediate focus of an extreme ultraviolet light source", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790D (1 April 2013); https://doi.org/10.1117/12.2011612

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