Imaging application tools for extremely low-k1 ArF immersion lithography

Shinichi Mori; Hajime Aoyama; Taro Ogata; Ryota Matsui; Tomoyuki Matsuyama

doi:10.1117/12.2011382

12 April 2013 Imaging application tools for extremely low-k1 ArF immersion lithography

Shinichi Mori, Hajime Aoyama, Taro Ogata, Ryota Matsui, Tomoyuki Matsuyama

Proceedings Volume 8683, Optical Microlithography XXVI; 86830A (2013) https://doi.org/10.1117/12.2011382
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

The k1 factor continues to be driven downward in ArF immersion lithography, even below its limit from optical theory, using various lithographic techniques such as combination of Source and Mask Optimization (SMO) and multiple patterning. Such a low k1 factor tends to lead to extremely high sensitivity tp imaging parameters such as aberrations, distortion, illumination pupilgram shape, dose, focus, etc. Therefore, fast, precise and stable settings of these parameters are crucial to make such hyper low k1 lithography practical. We introduce various kinds of imaging application tools and technique, which we have been developing, to support the imaging parameter settings and control. The application tools cover illumination pupilgram adjustment for freeform illumination, automatic aberration control, and thermal aberration parameter settings.

Citation Download Citation

Shinichi Mori, Hajime Aoyama, Taro Ogata, Ryota Matsui, and Tomoyuki Matsuyama "Imaging application tools for extremely low-k1 ArF immersion lithography", Proc. SPIE 8683, Optical Microlithography XXVI, 86830A (12 April 2013); https://doi.org/10.1117/12.2011382

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