Paper
28 March 2014 Computational studies of shape rectification in directed self-assembly
Tatsuhiro Iwama, Nabil Laachi, Kris T. Delaney, Bongkeun Kim, Glenn H. Fredrickson
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Abstract
We use self-consistent field theory (SCFT) to study shape rectification in overlapped cylindrical and non-cylindrical prepatterns. Specifically, we examine the potential of directed self-assembly (DSA) of block copolymers to not only reduce critical dimensions relative to the template, but also repair defects in the guiding prepatterns and produce defectfree contact holes. In our study over a wide range of prepattern dimensions, we found that defects in the central minorblock domain arise with decreasing center-to-center distance of the prepattern. Increasing the minor-block fraction in the block copolymer was observed to remove some of the defects. We also studied the effect of adding homopolymer to the block copolymer melt and show how blends can successfully eliminate defects and increase the range of the process window relative to the neat diblock case without influencing domain properties such as the critical dimension and the hole-to-hole distance.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsuhiro Iwama, Nabil Laachi, Kris T. Delaney, Bongkeun Kim, and Glenn H. Fredrickson "Computational studies of shape rectification in directed self-assembly", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904927 (28 March 2014); https://doi.org/10.1117/12.2046187
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Cited by 1 scholarly publication.
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KEYWORDS
Charge-coupled devices

Polymethylmethacrylate

Directed self assembly

Critical dimension metrology

Lithography

Bridges

Analytical research

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