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16 November 2022 Evolutionary step in EUV technology with high NA
Kaustuve Bhattacharyya, Rudy Peters, Greet Storms, Diederik de Bruin, Jara G. Santaclara, Rob van Ballegoij, Eelco van Setten, Teun van Gogh
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Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC1229201 (2022) https://doi.org/10.1117/12.2644966
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States
Abstract
Cost-effective scaling of semiconductor devices is enabled by High NA EUV technology, securing a solution for several technology nodes to come. High NA is an evolutionary step for EUV technology with new optics that increase the numerical aperture to 0.55NA. This paper discusses the benefits of High NA technology from a process complexity reduction point of view as well as the positive impact this will bring to the industry in terms of cost of technology reduction. The paper also explains how the learnings from current generation EUV tools are systematically implemented on High NA to achieve the highest possible maturity level at introduction. The High NA technology is positioned to support development work on advanced nodes (both for logic and memory) starting in 2023 and will support HVM from 2025. This paper will show the first results obtained during development and integration phase of various modules of the first High NA system (EXE:5000).
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Kaustuve Bhattacharyya, Rudy Peters, Greet Storms, Diederik de Bruin, Jara G. Santaclara, Rob van Ballegoij, Eelco van Setten, and Teun van Gogh "Evolutionary step in EUV technology with high NA", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC1229201 (16 November 2022); https://doi.org/10.1117/12.2644966
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KEYWORDS
Extreme ultraviolet
EUV optics
Lithography
Logic
New and emerging technologies
Semiconductors
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