Dr. Chie Shishido
Senior Researcher at Hitachi Ltd
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | 1 October 2011
Chie Shishido, Maki Tanaka, Akira Hamamatsu, Tomoharu Nagao
JM3, Vol. 10, Issue 04, 043017, (October 2011) https://doi.org/10.1117/12.10.1117/1.3664410
KEYWORDS: Scanning electron microscopy, Model-based design, Monte Carlo methods, Calibration, Cadmium, Mathematical modeling, 3D metrology, Scatterometry, Semiconducting wafers, Metrology

Proceedings Article | 20 April 2011 Paper
Chie Shishido, Maki Tanaka, Akira Hamamatsu
Proceedings Volume 7971, 79711S (2011) https://doi.org/10.1117/12.878745
KEYWORDS: Scanning electron microscopy, Calibration, Monte Carlo methods, Model-based design, 3D metrology, Mathematical modeling, Silicon, 3D image processing, Scatterometry, Semiconducting wafers

Proceedings Article | 20 April 2011 Paper
Miki Isawa, Maki Tanaka, Hideyuki Kazumi, Chie Shishido, Akira Hamamatsu, Norio Hasegawa, Peter De Bisschop, David Laidler, Philippe Leray, Shaunee Cheng
Proceedings Volume 7971, 79710Z (2011) https://doi.org/10.1117/12.878960
KEYWORDS: Cadmium, Critical dimension metrology, Photoresist materials, Atomic force microscopy, Metrology, Scanning electron microscopy, Finite element methods, Terbium, Semiconducting wafers, Double patterning technology

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013010, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541780
KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Critical dimension scanning electron microscopy, Monte Carlo methods, Model-based design, Silicon, Statistical analysis, Cadmium, Image processing

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76383I (2010) https://doi.org/10.1117/12.846402
KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Silicon, Model-based design, Image processing, Statistical analysis, Cadmium, Scattering

Showing 5 of 18 publications
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