Mr. David E. Noga Profile

David E. Noga

Grad Student at Georgia Institute of Technology

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 31 March 2010 Paper

The use of surface modifiers to mitigate pattern collapse in thin film lithography

David Noga, Wei-Ming Yeh, Richard Lawson, Laren Tolbert, Clifford Henderson

Proceedings Volume 7639, 76391H (2010) https://doi.org/10.1117/12.862008

KEYWORDS: Head-mounted displays, Photoresist materials, Electron beam lithography, Lithography, Silicon, Thin films, Molecules, Scanning electron microscopy, Standards development, Chemistry

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Proceedings Article | 31 March 2010 Paper

Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films

Wei-Ming Yeh, David Noga, Richard Lawson, Laren Tolbert, Clifford Henderson

Proceedings Volume 7639, 76391I (2010) https://doi.org/10.1117/12.862009

KEYWORDS: Polymer thin films, Thin films, Polymers, Crystals, Quartz, Semiconducting wafers, Silicon, Optical lithography, Chemistry, Silicon films

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Proceedings Article | 31 March 2010 Paper

Non-traditional resist designs using molecular resists: positive tone cross-linked and non-chemically amplified molecular resists

Richard Lawson, David Noga, Jing Cheng, Laren Tolbert, Clifford Henderson

Proceedings Volume 7639, 76392F (2010) https://doi.org/10.1117/12.848419

KEYWORDS: Electron beam lithography, Deep ultraviolet, Polymers, Line edge roughness, Molecules, Solids, Optical lithography, FT-IR spectroscopy, Image resolution, Lithography

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Proceedings Article | 30 March 2010 Paper

Methods to explore and prevent pattern collapse in thin film lithography

David Noga, Wei-Ming Yeh, Richard Lawson, Laren Tolbert, Clifford Henderson

Proceedings Volume 7639, 76392O (2010) https://doi.org/10.1117/12.848423

KEYWORDS: Photoresist materials, Lithography, Scanning electron microscopy, Photoresist processing, Chemistry, Capillaries, Liquids, Electron beam lithography, Thin films, Line edge roughness

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Proceedings Article | 26 March 2010 Paper

Aqueous and solvent developed negative-tone molecular resists

Richard Lawson, Jing Cheng, David Noga, Todd Younkin, Laren Tolbert, Clifford Henderson

Proceedings Volume 7639, 76390O (2010) https://doi.org/10.1117/12.848414

KEYWORDS: Molecules, Electron beam lithography, Deep ultraviolet, Line edge roughness, Polymers, Polymerization, Glasses, Dewetting, Optical lithography, Scanning electron microscopy

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SPIE Journal Paper | 1 October 2009

Nonionic photoacid generator behavior under high-energy exposure sources

Richard Lawson, David Noga, Laren Tolbert, Clifford Henderson

JM3, Vol. 8, Issue 04, 043010, (October 2009) https://doi.org/10.1117/12.10.1117/1.3259205

KEYWORDS: Deep ultraviolet, Absorbance, Polymers, Energy efficiency, Photons, Electron beams, Spectroscopic ellipsometry, Extreme ultraviolet, Refractive index, Absorption

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Proceedings Article | 1 April 2009 Paper

Non-ionic PAG behavior under high energy exposure sources

Richard Lawson, David Noga, Laren Tolbert, Clifford Henderson

Proceedings Volume 7273, 72731R (2009) https://doi.org/10.1117/12.814459

KEYWORDS: Deep ultraviolet, Absorbance, Energy efficiency, Polymers, Photons, Electron beams, Extreme ultraviolet, Refractive index, Spectroscopic ellipsometry, Ellipsometry

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Proceedings Article | 1 April 2009 Paper

Understanding pattern collapse in high-resolution lithography: impact of feature width on critical stress

David Noga, Richard Lawson, Cheng-Tsung Lee, Laren Tolbert, Clifford Henderson

Proceedings Volume 7273, 727334 (2009) https://doi.org/10.1117/12.829142

KEYWORDS: Photoresist materials, Liquids, Lithography, Capillaries, Photoresist processing, Optical lithography, Head-mounted displays, Distortion, Scanning electron microscopy, Polymer thin films

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Showing 5 of 8 publications

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