Mr. Hesham A. Diab Profile

Hesham A. Diab

TME at Siemens EDA

SPIE Involvement:

Author

Publications (3)

SPIE Journal Paper | 1 October 2009

Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point-spread function, and flare map calibration

Gian Lorusso, Frieda Van Roey, Eric Hendrickx, Germain Fenger, Michael Lam, Christian Zuniga, Mohamed Habib, Hesham Diab, James Word

JM3, Vol. 8, Issue 04, 041505, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238515

KEYWORDS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution

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Proceedings Article | 16 March 2009 Paper

Inverse vs. traditional OPC for the 22nm node

James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou, Hesham Diab, Mohamed Gheith, Mohamed Habib, Cynthia Zhu

Proceedings Volume 7274, 72743A (2009) https://doi.org/10.1117/12.814339

KEYWORDS: Optical proximity correction, Photomasks, Metals, Double patterning technology, Resolution enhancement technologies, Lithography, Manufacturing, Logic, Shape analysis, Visualization

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Proceedings Article | 21 March 2007 Paper

Litho aware method for circuit timing/power analysis through process

R. Fathy, M. Al-Imam, H. Diab, M. Fakhry, J. A. Torres, B. Graupp, J. M. Brunet, M. Bahnas

Proceedings Volume 6521, 65210O (2007) https://doi.org/10.1117/12.711723

KEYWORDS: Lithography, Oscillators, Semiconducting wafers, Transistors, Visualization, Design for manufacturing, Integrated circuit design, Silicon, Process modeling, Etching

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