This presentation introduces the technology and capabilities of the current ULTRA mask writer by Heidelberg Instruments and explains more in detail the possibilities to enhance the performance by introducing software-based optimizations with the MASKER and BEAMER software tools introduced by Genisys GmbH. We will discuss the results for CD linearity and CD uniformity accomplished by ULTRA, the feature fidelity correction and will also look at plans for further developments.
Conference Committee Involvement (3)
Novel Patterning Technologies 2025
23 February 2025 | San Jose, California, United States
Novel Patterning Technologies 2024
26 February 2024 | San Jose, California, United States
Novel Patterning Technologies 2023
27 February 2023 | San Jose, California, United States
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