Dong-Hoon Chung
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 13 July 2017 Paper
Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo
Proceedings Volume 10454, 104540J (2017) https://doi.org/10.1117/12.2282406
KEYWORDS: Databases, Photomasks, Lithography, Inspection, Data processing

Proceedings Article | 23 October 2015 Paper
Bhamidipati Samir, Mark Pereira, Sankaranarayanan Paninjath, Chan-Uk Jeon, Dong-Hoon Chung, Gi-Sung Yoon, Hong-Yul Jung
Proceedings Volume 9635, 963520 (2015) https://doi.org/10.1117/12.2202511
KEYWORDS: Inspection, Photomasks, Defect inspection, Liquids, Coating, Image processing, Neodymium, Extreme ultraviolet, Semiconducting wafers, Optical properties

Proceedings Article | 16 September 2014 Paper
Ute Buttgereit, Thomas Trautzsch, Min-ho Kim, Jung-Uk Seo, Young-Keun Yoon, Hak-Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Gary Meyers
Proceedings Volume 9235, 92350B (2014) https://doi.org/10.1117/12.2065937
KEYWORDS: Computed tomography, Image processing, Critical dimension metrology, Logic devices, Optical proximity correction, Image analysis, Photomasks, Metrology, Logic, Printing

Proceedings Article | 28 July 2014 Paper
Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, Soichi Shida, Takayuki Nakamura
Proceedings Volume 9256, 92560D (2014) https://doi.org/10.1117/12.2069368
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Metrology, Semiconductors, Error analysis, Optical proximity correction, Reliability, Tolerancing, Lithography

Proceedings Article | 1 October 2013 Paper
In Yong Kang, Gisung Yoon, Jonghee Lee, Donghoon Paul Chung, Byung-Gook Kim, Chan-Uk Jeon, Gregg Inderhees, Trent Hutchinson, Wonil Cho, Jiuk Hur
Proceedings Volume 8886, 88860O (2013) https://doi.org/10.1117/12.2030976
KEYWORDS: Inspection, Photomasks, SRAF, Printing, Source mask optimization, Calibration, Model-based design, Scanners, Lithography, Image processing

Showing 5 of 39 publications
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