Dr. Shinji Tarutani
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 17 April 2014 Paper
Hideaki Tsubaki, Shinji Tarutani, Toru Fujimori, Hiroo Takizawa, Takahiro Goto
Proceedings Volume 9048, 90481E (2014) https://doi.org/10.1117/12.2046205
KEYWORDS: Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Line width roughness, Lithography, Diffusion, Optical lithography, Absorption, Surface roughness, Photoresist processing

Proceedings Article | 1 April 2013 Paper
Hideaki Tsubaki, Shinji Tarutani, Naoki Inoue, Hiroo Takizawa, Takahiro Goto
Proceedings Volume 8679, 867905 (2013) https://doi.org/10.1117/12.2011357
KEYWORDS: Diffusion, Extreme ultraviolet lithography, Polymers, Line width roughness, Extreme ultraviolet, Contamination, Electron beam lithography, Semiconducting wafers, Lithography, Scanning electron microscopy

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 868217 (2013) https://doi.org/10.1117/12.2011386
KEYWORDS: Line width roughness, Polymers, Amplifiers, Diffusion, Line edge roughness, Extreme ultraviolet, Semiconducting wafers, Photoresist processing, Extreme ultraviolet lithography, Molecules

Proceedings Article | 29 March 2013 Paper
Shinji Tarutani, Wataru Nihashi, Shuuji Hirano, Natsumi Yokokawa, Hiroo Takizawa
Proceedings Volume 8682, 868214 (2013) https://doi.org/10.1117/12.2011384
KEYWORDS: Polymers, Nanoimprint lithography, Image processing, Photoresist processing, Extreme ultraviolet, Materials processing, Image resolution, Image quality, Imaging systems, Photomasks

SPIE Journal Paper | 14 August 2012
Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu, Akiko Hattori, Kouji Shitabatake, Shinji Tarutani, Kunihiko Kodama, Hideto Tanabe
JM3, Vol. 11, Issue 3, 033008, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.033008
KEYWORDS: Etching, Quartz, Resistance, Fluorine, Nanoimprint lithography, Lithography, Photoresist processing, Silicon, Dry etching, Contamination

Showing 5 of 26 publications
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