Mr. Stan Barnett Profile

Stan Barnett

Principal MTS at Maxim Integrated Products Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 23 June 2000 Paper

Contact hole size-reducing methods by using water-soluble organic over-coating material (WASOOM) as a barrier layer toward 0.15-um contact hole: resist flow technique I

Jun-Sung Chun, Shekhar Bakshi, Stanley Barnett, James Shih, Shih-Ked Lee

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388347

KEYWORDS: Photomasks, Etching, Photoresist processing, Semiconducting wafers, Plasma etching, Coating, Plasma, Polymethylmethacrylate, Scanning electron microscopy, Optical lithography

Read Abstract +

Proceedings Article | 23 June 2000 Paper

SiON as a panacea for KrF photolithography? Study on process optimization, substrate dependency, and delay time stability on silicon nitride and BPTEOS film

Jun-Sung Chun, Shekhar Bakshi, Stanley Barnett, James Shih, Shih-Ked Lee

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388356

KEYWORDS: Silicon, Silicon films, Etching, Semiconducting wafers, Critical dimension metrology, Oxygen, Oxides, Chemistry, Compact discs, Plasma treatment

Read Abstract +

Proceedings Article | 26 July 1999 Paper

Effect of mask critical dimension error for subquarter-micron contact hole

Hung-Eil Kim, Jun-Sung Chun, Stanley Barnett, James Shih

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354400

KEYWORDS: Photomasks, Critical dimension metrology, Binary data, Semiconducting wafers, Cadmium, Printing, Phase shifts, Image processing, Photoresist processing, Scanners

Read Abstract +

Proceedings Article | 11 June 1999 Paper

Novel hardening methods of DUV chemically amplified photoresist by ion implantation and its application to new organic ARC material and bilayer process

Jun-Sung Chun, Hung-Eil Kim, Stanley Barnett, James Shih

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350190

KEYWORDS: Ions, Etching, Photoresist materials, Argon, Ion implantation, Deep ultraviolet, Photoresist processing, Resistance, Dry etching, Chemically amplified resists

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Optimization of stepper parameters and its design rule for an attenuated phase-shifting mask

Hung-Eil Kim, Stanley Barnett, James Shih

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310782

KEYWORDS: Printing, Photomasks, Critical dimension metrology, Optical proximity correction, Phase shifts, Semiconducting wafers, Etching, Defect inspection, Transmittance, Lithography

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Challenge of 0.3-k1 lithography by optimizing NA/sigma, OAI, biasing, and BARC: practical approach to quarter-micron i-line process

KeunYoung Kim, Stanley Barnett, James Shih

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310797

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Critical dimension metrology, Optics manufacturing, Silicon, Optical lithography, Antireflective coatings, Lithographic illumination

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years