Generating mechanism and eliminating method of striated haze in advanced mitigation process

Heng Zhao; Chao Cai; Xiang He; Jinyong Huang; Ping Ma

doi:10.1117/12.2504849

16 January 2019 Generating mechanism and eliminating method of striated haze in advanced mitigation process

Heng Zhao, Chao Cai, Xiang He, Jinyong Huang, Ping Ma

Proceedings Volume 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 108380C (2019) https://doi.org/10.1117/12.2504849
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

Advanced mitigation process (AMP) has been identified as a most effective method to improve the laser induced damage threshold of the fused silica optics used in the large laser facility, and as the most important sub-process HF etching with multi-frequency megasonic agitation plays a decisive role to improve the damage threshold of fused silica. But because of the physical characteristics of megasonic, the etched surface is apt to generate striated haze which not only modulates the optical field, but also reduces the damage threshold significantly. In this paper, the generating mechanism of the striated haze is discussed, and both of the uneven acoustic field distribution and the optics' redeposited substance are recognized as the primary factor resulted this phenomenon, ultimately based on these discussions a slight swing when etching is proposed to eliminate this phenomenon.

Citation Download Citation

Heng Zhao, Chao Cai, Xiang He, Jinyong Huang, and Ping Ma "Generating mechanism and eliminating method of striated haze in advanced mitigation process", Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108380C (16 January 2019); https://doi.org/10.1117/12.2504849

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