Paper
16 January 2019 Effect of etching parameters on the surface quality and laser damage thresholds of fused silica with megasonic-assisted HF acid etching
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Proceedings Volume 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 108381N (2019) https://doi.org/10.1117/12.2506882
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China
Abstract
HF-based etching has been an effective method to increase the laser induced damage thresholds (LIDTS) of fused silica optics. In this research, the effect of etching parameters on the surface quality and laser damage performance of fused silica with Megasonic-assisted HF acid etching has been investigated systematically. The fused silica samples (50mm in diameter and 5mm thick) were maufactured through the conventional grinding and chemical mechanical polishing process, these processed samples are etched with different etching parameters. Our results show that the frequency and distribution of megasonic field will bring great effect on the surface quality of optics. The LIDTS were measured by 1- on-1 mode, results showed that the 1.3MHz megasonic field and a certain amount of etching depth will benefit the laser damage performance of fused silica optics.
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Chao Cai, Xiang He, Heng Zhao, Gang Wang, Jinyong Huang, and Ping Ma "Effect of etching parameters on the surface quality and laser damage thresholds of fused silica with megasonic-assisted HF acid etching", Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108381N (16 January 2019); https://doi.org/10.1117/12.2506882
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KEYWORDS
Etching

Silica

Acoustics

Laser induced damage

Laser damage threshold

HF etching

Hydrogen fluoride lasers

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