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5 November 2020 Effects of mid-spatial frequency surface error on pupil characteristic parameters in lithography illumination system
Shuang Gong, Baoxi Yang, Huijie Huang
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Proceedings Volume 11568, AOPC 2020: Optics Ultra Precision Manufacturing and Testing; 1156820 (2020) https://doi.org/10.1117/12.2580348
Event: Applied Optics and Photonics China (AOPC 2020), 2020, Beijing, China
Abstract
The influence of mid-spatial frequency surface error on illumination pupil in the lithography illumination system is analyzed. The far-field distribution of the pupil under the influence of the mid-spatial frequency surface error is derived. Using the actual manufactured surface error combined with commercial optical design software to simulate the relay lens group in the photolithography illumination, analyze the influence of the mid-spatial frequency surface error in different fields of view on the pupil ellipticity, X-direction pupil balance and Y-direction pupil balance. This simulation method can be used at the design stage by using the actual manufactured profile, which provides a reference for optical design.
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Shuang Gong, Baoxi Yang, and Huijie Huang "Effects of mid-spatial frequency surface error on pupil characteristic parameters in lithography illumination system", Proc. SPIE 11568, AOPC 2020: Optics Ultra Precision Manufacturing and Testing, 1156820 (5 November 2020); https://doi.org/10.1117/12.2580348
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KEYWORDS
Lithographic illumination
Error analysis
Lithography
Surface finishing
Photomasks
Aspheric lenses
Manufacturing
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