Checkpointing in EDA application for tapeout operation

Kuang Han Chen; Soohong Kim; Hien T. Vu; Stephen Kim; Ming Feng Shen

doi:10.1117/12.2641214

15 September 2022 Checkpointing in EDA application for tapeout operation

Kuang Han Chen, Soohong Kim, Hien T. Vu, Stephen Kim, Ming Feng Shen

Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 1232507 (2022) https://doi.org/10.1117/12.2641214
Event: Photomask Japan 2022, 2022, Online Only

Abstract

Advances in chip manufacturing processes continue to increase the number of vertices to deal with in Optical Proximity Correction (OPC) and Mask Data Preparation (MDP). In order to manage the processing time, OPC in sub-nanometer now requires employing tens of thousands of CPU cores. A slight mishap can force the job to be re-run. Increased complexity in the computing environment, along with the length of time a job spends in it, makes a job more susceptible to various sources of failures, while the re-run penalty is also growing with the design complexity. Checkpointing is a technique that saves the state of a system that continuously transitions to another state. The purpose of creating a checkpoint for a job is to make it possible to restart an interrupted job from the saved state at a later time. With checkpointing, if a running job encounters termination before its normal completion, be it due to a hardware failure or a human intervention to make resources available for an urgent job, it can resume from the checkpoint closest to the point of termination and continue to its completion. Checkpointing applications can include 1) resume flow where a terminated job can be resumed from the point close to the termination, 2) repair flow to fix OPC hotspot areas without having to process the entire chip and 3) cloud usage where job migration may be necessary. In this paper, we study the runtime and storage impact with checkpointing and demonstrate virtually no runtime impact and very minimal increase in filer storage. Furthermore, we show how checkpointing can significantly reduce runtime in OPC hotspot repair applications

Citation Download Citation

Kuang Han Chen, Soohong Kim, Hien T. Vu, Stephen Kim, and Ming Feng Shen "Checkpointing in EDA application for tapeout operation", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232507 (15 September 2022); https://doi.org/10.1117/12.2641214

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KEYWORDS

Optical proximity correction

Photomasks

Electronic design automation

Resolution enhancement technologies

Data storage

SRAF

Scattering

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