Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography

Diko J. Hemminga; Lucas Poirier; Javier Hernandez-Rueda; Bo Liu; Adam Lassise; Ronnie Hoekstra; John Sheil; Oscar O. Versolato

doi:10.1117/12.2657496

28 April 2023 Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography

Diko J. Hemminga, Lucas Poirier, Javier Hernandez-Rueda, Bo Liu, Adam Lassise, Ronnie Hoekstra, John Sheil, Oscar O. Versolato

Author Affiliations +

Proceedings Volume 12494, Optical and EUV Nanolithography XXXVI; 124941B (2023) https://doi.org/10.1117/12.2657496
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

State-of-the-art nanolithography machines employ extreme ultraviolet (EUV) light to pattern nanometer-scale features on silicon wafers for the production of integrated circuits. This radiation is generated in a laserproduced plasma formed on tin microdroplet targets. In this contribution, we give an overview of our recent experimental and theoretical studies on the properties of tin plasmas driven by short-wavelength lasers and the subsequent tin fluid dynamics. First, we will present a comprehensive characterization of the properties of laserproduced tin plasmas driven by lasers with wavelengths in the 1–10 µm range. Second, we present absolutely calibrated, charge-state-resolved measurements of the ion kinetic energy distribution recorded under multiple detection angles. Through extensive radiation-hydrodynamic simulations of the plasma formation, growth and expansion, we demonstrate that a single-fluid approach accurately reproduces the angular dependence of the ion energy distribution. Moreover, we identify the origin of a high-energy peak in the distribution as a high-speed shell generated at early times in the expansion. Finally, we show that the time evolution of the droplet target morphology is entirely determined by the early-time plasma-driven pressure impulse on the droplet.

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Diko J. Hemminga, Lucas Poirier, Javier Hernandez-Rueda, Bo Liu, Adam Lassise, Ronnie Hoekstra, John Sheil, and Oscar O. Versolato "Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography", Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI, 124941B (28 April 2023); https://doi.org/10.1117/12.2657496

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