Recent advancement and future plans on electron multi-beam mask writers

Jumpei Yasuda; Tomoo Motosugi; Hayato Kimura; Kenichi Yasui; Hiroshi Matsumoto; Michihiro Kawaguchi; Yoshinori Kojima; Masato Saito

doi:10.1117/12.3034512

12 November 2024 Recent advancement and future plans on electron multi-beam mask writers

Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Kenichi Yasui, Hiroshi Matsumoto, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 1321617 (2024) https://doi.org/10.1117/12.3034512
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

The multi-beam mask writer MBM-3000 has been launched since 2023 for next-generation EUV mask production. It is equipped with 12-nm beamlets and a powerful cathode that brings out a current density of 3.6 A/cm2, in order to achieve better resolution and writing speed than our current writer MBM-2000PLUS. New optics with a next-generation blanking aperture array (BAA) is installed to have a 2X beam count. A data generation system has a 2X speed so that it can handle layouts of next-generation EUV masks without a data processing overhead. The writing accuracy and throughput improvements of the MBM-3000 have been confirmed not only in the in-house process, but also at several customers’ sites.

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Citation Download Citation

Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Kenichi Yasui, Hiroshi Matsumoto, Michihiro Kawaguchi, Yoshinori Kojima, and Masato Saito "Recent advancement and future plans on electron multi-beam mask writers", Proc. SPIE 13216, Photomask Technology 2024, 1321617 (12 November 2024); https://doi.org/10.1117/12.3034512

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