Dr. Hiroshi Matsumoto Profile

Dr. Hiroshi Matsumoto

Technical Expert at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 12 November 2024 Presentation + Paper

Recent advancement and future plans on electron multi-beam mask writers

Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Kenichi Yasui, Hiroshi Matsumoto, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito

Proceedings Volume 13216, 1321617 (2024) https://doi.org/10.1117/12.3034512

KEYWORDS: Extreme ultraviolet, Beam path, Industry, Glasses, Resolution enhancement technologies, Semiconductors, Scanners, Quartz, Photoresist processing, Optical systems

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Proceedings Article | 18 September 2024 Paper

Recent progress of multi-beam mask writer MBM-3000

Issei Aibara, Hiroshi Matsumoto, Jumpei Yasuda, Ken-ichi Yasui, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito, Noriaki Nakayamada

Proceedings Volume 13273, 132730O (2024) https://doi.org/10.1117/12.3028706

KEYWORDS: Industry, Extreme ultraviolet, Design, Singular optics, Semiconducting wafers, Optical lithography, Optical design, Glasses, Extreme ultraviolet lithography, Deep ultraviolet

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Proceedings Article | 26 August 2024 Paper

Recent advancements of multibeam mask writer MBM-3000

Moeka Oshiro, Jumpei Yasuda, Hiroshi Matsumoto, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada

Proceedings Volume 13177, 131770U (2024) https://doi.org/10.1117/12.3034396

KEYWORDS: Beam path, Optical systems, Industry, Glasses, Extreme ultraviolet, Resolution enhancement technologies, Semiconductors, Scanners, Optical lithography, Optical design

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Proceedings Article | 9 April 2024 Presentation + Paper

Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada

Proceedings Volume 12956, 1295602 (2024) https://doi.org/10.1117/12.3010686

KEYWORDS: Extreme ultraviolet, Aberration correction, Optical lithography, Optical design, Resolution enhancement technologies, Printing, Distortion, Semiconducting wafers, Projection systems

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Proceedings Article | 21 November 2023 Presentation + Paper

Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12751, 127510X (2023) https://doi.org/10.1117/12.2687415

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Projection lithography, Resolution enhancement technologies, Distortion, Mask making

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Proceedings Article | 1 May 2023 Presentation + Paper

Current performance and future plans on electron multi-beam mask writers toward high-NA EUV era

Hiroshi Matsumoto, Haruyuki Nomura, Hayato Kimura, Keisuke Yamaguchi, Yoshinori Kojima, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12497, 1249708 (2023) https://doi.org/10.1117/12.2657994

KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

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Proceedings Article | 11 November 2022 Presentation

Selective leading-edge mask writing and high-throughput mask writing in multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume PC12293, PC122930I (2022) https://doi.org/10.1117/12.2641449

KEYWORDS: Photomasks, Glasses, Semiconductors, Physical phenomena, Optical lithography, Mask making, Line edge roughness, Extreme ultraviolet lithography, Error analysis, Edge roughness

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Proceedings Article | 16 September 2022 Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Noriaki Nakayamada

Proceedings Volume 12325, 123250O (2022) https://doi.org/10.1117/12.2641338

KEYWORDS: Photomasks, Line edge roughness, Mask making, Metrology, Data conversion, Convolution, Data processing

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Proceedings Article | 25 May 2022 Presentation + Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Nariaki Nakayamada

Proceedings Volume 12054, 1205408 (2022) https://doi.org/10.1117/12.2616664

KEYWORDS: Photomasks, Line edge roughness, Mask making, Data conversion, Data processing

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Proceedings Article | 1 October 2021 Presentation

Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11855, 118550W (2021) https://doi.org/10.1117/12.2600904

KEYWORDS: Photomasks, Optical design, Distortion, Data processing, Scattering, Photoresist processing, Modulation, Laser scattering, Glasses, Forward error correction

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Proceedings Article | 23 August 2021 Paper

Multi-beam mask writer, MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11908, 119080L (2021) https://doi.org/10.1117/12.2604378

KEYWORDS: Photomasks, Thermal effects, Modulation, Vestigial sideband modulation, Forward error correction, Extreme ultraviolet lithography, Thin film coatings, Semiconductors, Semiconducting wafers, Error analysis

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Proceedings Article | 24 February 2021 Presentation

Multi-beam mask writer MBM-2000 (Conference Presentation)

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11610, 116100Y (2021) https://doi.org/10.1117/12.2586288

KEYWORDS: Photomasks, Optical design, Distortion, Data processing, Scattering, Photoresist processing, Modulation, Laser scattering, Glasses, Forward error correction

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Proceedings Article | 20 September 2020 Presentation

Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Kenichi Yasui

Proceedings Volume 11518, 115180A (2020) https://doi.org/10.1117/12.2573147

KEYWORDS: Optical design, Electron beam lithography, Scattering, Distortion, Vestigial sideband modulation, Optical proximity correction, Forward error correction, Laser scattering, Extreme ultraviolet, Photoresist processing

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Proceedings Article | 23 March 2020 Paper

Contribution ratio of process fidelity and beam accuracy in multi-beam mask writing

Rumi Ito, Yoshinori Kojima, Hiroshi Matsumoto

Proceedings Volume 11324, 113241A (2020) https://doi.org/10.1117/12.2551847

KEYWORDS: Line edge roughness, Spatial frequencies, Image processing, Etching, Photomasks, Optical lithography, Chromium, Photoresist processing, Picosecond phenomena, Edge roughness

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Proceedings Article | 26 March 2019 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hayato Kimura, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10958, 109580J (2019) https://doi.org/10.1117/12.2515200

KEYWORDS: Photomasks, Extreme ultraviolet, Photoresist processing, Electron beam lithography, Electron beams

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SPIE Journal Paper | 24 September 2018

Multibeam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

JM3, Vol. 17, Issue 03, 031205, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.031205

KEYWORDS: Modulation, Photomasks, Optical lithography, Critical dimension metrology, Image resolution, Line edge roughness, Photoresist processing, Electron beam lithography, Vestigial sideband modulation, Convolution

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Proceedings Article | 12 June 2018 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10807, 1080707 (2018) https://doi.org/10.1117/12.2502599

KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Electron beam lithography, Electron beams

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Proceedings Article | 5 April 2018 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10584, 105840H (2018) https://doi.org/10.1117/12.2299885

KEYWORDS: Modulation, Photomasks, Photoresist processing, Electron beam lithography, Optical lithography, Image resolution, Electron beams, Beam shaping, Vestigial sideband modulation, Convolution

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Proceedings Article | 16 October 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 10451, 1045117 (2017) https://doi.org/10.1117/12.2280502

KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

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Proceedings Article | 28 September 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10446, 1044607 (2017) https://doi.org/10.1117/12.2280453

KEYWORDS: Data processing, Photomasks, Data storage, Vestigial sideband modulation, Relays, Interfaces, Data conversion, Modulation, Photoresist processing, Image processing

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Proceedings Article | 13 July 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10454, 104540E (2017) https://doi.org/10.1117/12.2283033

KEYWORDS: Photomasks, Data storage, Relays, Vestigial sideband modulation, Modulation, Data processing, Extreme ultraviolet lithography, Semiconductors, High volume manufacturing, Optical design

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Proceedings Article | 10 May 2016 Paper

Multi-beam mask writer MBM-1000 and its application field

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Hirofumi Morita, Satoru Hirose, Munehiro Ogasawara, Hirokazu Yamada, Kiyoshi Hattori

Proceedings Volume 9984, 998405 (2016) https://doi.org/10.1117/12.2245177

KEYWORDS: Vestigial sideband modulation, Photomasks, Electron beam melting, Data storage, Beam shaping, Lenses, Data conversion, Printing, Optical proximity correction, Line edge roughness

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Proceedings Article | 8 November 2012 Paper

Proposal of an extended loading effect correction for EBM-8000

Hiroshi Matsumoto, Yasuo Kato, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori

Proceedings Volume 8522, 85221G (2012) https://doi.org/10.1117/12.975920

KEYWORDS: Critical dimension metrology, Modulation, Etching, Photomasks, Scattering, Backscatter, Lead, Error analysis, Electron beam melting, Laser scattering

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Proceedings Article | 14 October 2011 Paper

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Hiroshi Matsumoto, Yasuo Kato, Tomoo Motosugi, Jun Yashima, Takayuki Abe, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori

Proceedings Volume 8166, 816620 (2011) https://doi.org/10.1117/12.898846

KEYWORDS: Forward error correction, Critical dimension metrology, Modulation, Photomasks, Data processing, Data corrections, Software development, Scattering, Data modeling, Electron beam melting

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SPIE Journal Paper | 1 October 2008

High-accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account

Takayuki Abe, Jun Yashima, Hayato Shibata, Yasuo Kato, Hiroshi Matsumoto, Tomohiro Iijama

JM3, Vol. 7, Issue 04, 043008, (October 2008) https://doi.org/10.1117/12.10.1117/1.3013546

KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

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Showing 5 of 25 publications

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