Dissolution behavior of novolak resins

K. Rex Chen; George M. Jordhamo; Wayne M. Moreau

doi:10.1117/12.241854

14 June 1996 Dissolution behavior of novolak resins

K. Rex Chen, George M. Jordhamo, Wayne M. Moreau

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241854
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Novolak and polyhydroxystyrene (PHS) constitute the film forming polymers of positive resists. Laser interferometry was used to study the dissolution and film morphology of spun cast films. PHS forms uniform films with polymer chains preferentially orientated. Novolak resins exhibit disruption of ordering throughout the depth of the film. Thicker (greater than 1 micrometer) films of novolak are more disordered. Casting solvents can also alter film morphology. Micron thick films of novolak resins, except for monodisperse fractions, show disruption of order, especially in layers at the vicinity of the substrate. Thicker novolak films exhibit more disorder due to solvent/surface tension gradients. PHS films of higher Tg are not sensitive to coating disruptions. The addition of surfactants eliminates global radial phase separation of diazoquinone and novolak and restores uniform orientation in plane of dissolution by neutralizing surface tension driven gradients.

Citation Download Citation

K. Rex Chen, George M. Jordhamo, and Wayne M. Moreau "Dissolution behavior of novolak resins", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241854

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