Fast and accurate optical proximity correction based on aerial image simulation

Tetsuro Hanawa; Kazuya Kamon; Akihiro Nakae; Shuji Nakao; Koichi Moriizumi

doi:10.1117/12.240929

7 June 1996 Fast and accurate optical proximity correction based on aerial image simulation

Tetsuro Hanawa, Kazuya Kamon, Akihiro Nakae, Shuji Nakao, Koichi Moriizumi

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240929
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Because optical lithography requires precise CD control, we developed a fast, accurate proximity correction method based on aerial image simulation. Simple formulas using a linear combination of simulated aerial image intensities both at and around mask edge were found effective for fast, precise CD prediction. Using the developed CD prediction and the fine biasing correction methods, we verified that various two-dimensional patterns printed by an i- line stepper using modified illumination and binary intensity mask are satisfactorily corrected; i.e., CD deviations from designed values, line shortening and feature deformations are effectively reduced.

Citation Download Citation

Tetsuro Hanawa, Kazuya Kamon, Akihiro Nakae, Shuji Nakao, and Koichi Moriizumi "Fast and accurate optical proximity correction based on aerial image simulation", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240929

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